Show item record

dc.contributor.advisorMousseau, Normandfr
dc.contributor.authorKallel, Houssemfr
dc.date.accessioned2012-05-28T13:55:41Z
dc.date.available2012-05-28T13:55:41Z
dc.date.issued2008-08-07fr
dc.date.submitted2008fr
dc.identifier.urihttp://hdl.handle.net/1866/8027
dc.subjectSilicium amorphefr
dc.subjectRelaxationfr
dc.subjectStructurefr
dc.subjectDéfauts de liaisonfr
dc.subjectSurface d'énergie potentiellefr
dc.subjectNano-calorimétrie différentielle à balayagefr
dc.subjectAmorphous siliconfr
dc.subjectRelaxationfr
dc.subjectStructurefr
dc.subjectRadial distribution functionfr
dc.subjectBond defectsfr
dc.subjectPotential energy surfacefr
dc.subjectDifferential scanning nano-calorimetryfr
dc.titleEffets de la concentration des défauts sur la surface d'énergie potentielle du silicium amorphefr
dc.typeThèse ou mémoire / Thesis or Dissertationfr
etd.degree.disciplinePhysiquefr
etd.degree.grantorUniversité de Montréalfr
etd.degree.levelMaîtrise / Master'sfr
etd.degree.nameM. Sc.fr
dcterms.descriptionMémoire numérisé par la Division de la gestion de documents et des archives de l'Université de Montréal.fr
dcterms.languagefrafr


Files in this item

Thumbnail

This item appears in the following Collection(s)

Show item record

This document disseminated on Papyrus is the exclusive property of the copyright holders and is protected by the Copyright Act (R.S.C. 1985, c. C-42). It may be used for fair dealing and non-commercial purposes, for private study or research, criticism and review as provided by law. For any other use, written authorization from the copyright holders is required.