Focussed helium ion channeling through Si nanomembranes
| dc.date.accessioned | 2018-03-14T19:02:49Z | |
| dc.date.available | 2018-03-14T19:02:49Z | |
| dc.date.issued | 2018-03-15 | |
| dc.identifier.uri | http://hdl.handle.net/1866/19871 | |
| dc.title | Focussed helium ion channeling through Si nanomembranes | fr |
| dc.type | Article | fr |
| dc.contributor.affiliation | Université de Montréal. Faculté des arts et des sciences. Département de physique | fr |
| dc.identifier.doi | 10.1116/1.5020667 | |
| dcterms.abstract | Channeling of low energy (25 to 35 keV) focussed He ions transmitted through crystalline Si (001) nanomembranes (50nm) has been observed using a He ion microscope. Planar (110) and (100) channeling was detected with critical incident angles of 1.0 at 35 keV. Beam steering of up to 2 occurs. The technique has potential for He ion diffraction and femtometer-scale detection of inter- stitial atoms and impurities. | fr |
| dcterms.language | eng | fr |
| UdeM.VersionRioxx | Version acceptée / Accepted Manuscript | fr |
| oaire.citationTitle | Journal of vacuum science & technology B | |
| oaire.citationVolume | 36 | |
| oaire.citationIssue | 2 |
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