Étude de phase des systèmes Ni/Si-endommagé et Ni/a-Si, par XRD résolue en temps et nanocalorimétrie

Guihard, Matthieu

dc.contributor.advisor	Schiettekatte, François	fr
dc.contributor.advisor	Roorda, Sjoerd	fr
dc.contributor.author	Guihard, Matthieu	fr
dc.date.accessioned	2012-05-28T13:55:48Z
dc.date.available	2012-05-28T13:55:48Z
dc.date.issued	2009-12-03	fr
dc.date.submitted	2008	fr
dc.identifier.uri	http://hdl.handle.net/1866/8045
dc.subject	Siliciures de nickel	fr
dc.subject	a-SI	fr
dc.subject	c-Si	fr
dc.subject	NiSi	fr
dc.subject	Nickel silicides	fr
dc.subject	a-Si	fr
dc.subject	c-Si	fr
dc.subject	NiSi	fr
dc.title	Étude de phase des systèmes Ni/Si-endommagé et Ni/a-Si, par XRD résolue en temps et nanocalorimétrie	fr
dc.type	Thèse ou mémoire / Thesis or Dissertation	fr
etd.degree.discipline	Physique	fr
etd.degree.grantor	Université de Montréal	fr
etd.degree.level	Maîtrise / Master's	fr
etd.degree.name	M. Sc.	fr
dcterms.description	Mémoire numérisé par la Division de la gestion de documents et des archives de l'Université de Montréal.	fr
dcterms.language	eng	fr

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