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dc.contributor.advisorLewis, Laurent J.
dc.contributor.advisorRoorda, Sjoerd
dc.contributor.authorDias, Cristiano Luis
dc.date.accessioned2023-09-29T14:51:39Z
dc.date.available2023-09-29T14:51:39Z
dc.date.issued2002
dc.date.submitted2001
dc.identifier.urihttp://hdl.handle.net/1866/29610
dc.subjectRéseau aléatoire continu
dc.subjectApproximation des liaisons fortes
dc.subjectDynamique moléculaire
dc.subjectLacune
dc.subjectInterstitiel
dc.subjectCoordination
dc.subjectVolume de Voronoï
dc.subjectCharge
dc.subjectLien pendant
dc.titleInfluence des défauts ponctuels sur la relaxation du silicium amorphe
dc.typeThèse ou mémoire / Thesis or Dissertation
etd.degree.disciplinePhysiquefr
etd.degree.grantorUniversité de Montréalfr
etd.degree.levelMaîtrise / Master's
etd.degree.nameM. Sc.
dcterms.descriptionMémoire numérisé par la Direction des bibliothèques de l'Université de Montréal.fr
dcterms.languagefra


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